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Epson Hosts Fashion Week Event in NYC
Mar 09 2016 10:12:51 , 1170

Long Beach, California-based Epson America recently hosted its second annual “Digital Couture” event as part of New York City’s Fashion Week in mid-February. The event featured 11 designers’ collections created using Epson’s dye-sublimation printing technology.


The goal of the collaboration, according to Epson, was to showcase the impact of Epson’s dye-sublimation printing on design inspiration and workflows and enable designers to bring their creative visions to fabric in new and versatile ways.


The designers, from both the U.S. and Latin America, were tasked with creating three complete looks using fabrics they created with Epson printers, with the theme of “harmony and peace through fashion.” They used a variety of garments to illustrate their vision, including full-zip varsity jackets, cargo pants and capris, swimwear, footwear and more.


The detail and vibrant colors of the designs came courtesy of Epson’s SureColor F6200, F7200 and F9200 dye sublimation machines.

Epson first launched its line of dye sub printers in 2013. Since then, it has taken heed of customer feedback to make marked improvements to the technology, most notably with its high density black ink that offers deeper saturation than ever before, the company says.


The event took place in the trendy Chelsea district of Manhattan and featured a live DJ, open bar and models on display so attendees could get up-close looks at their designs. All 11 designers attended and shared some details on their motivation and design choices.